RF sputter deposition of amorphous TiOₓ films: role of deposition time

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Home / Volume 21 / Issue 5 / DOI: 10.15251/JOR.2025.215.513

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RF sputter deposition of amorphous TiOₓ films: role of deposition time

J. Ovonic. Res. 2025 , 21(5), 513–527; https://doi.org/10.15251/JOR.2025.215.513